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    • BEAMER
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  • Applications
    • Beamer
      • PEC
        • 3D Correction for Dolan Technique
        • Exposure dose for targets and large areas
        • Influence of Shape PEC on Resist Profile
        • 3D E-beam lithography
        • Managing PEC Data Volume to Improve Throughput
        • Dose Assignments for Exposures on Thin Membranes
        • Optimisation of relative dose exposure for critical features
      • Laser PEC
        • Laser Grayscale Lithography
      • Writing Strategy
        • Exposure Strategies for Optimised Writing
        • Multipass Techniques
        • Bulk & sleeving of patterns for time writing optimisation
        • Fracturing of periodic layouts for photonic crystals
      • Data handling
        • Designing Fresnel zone plates using formulas in BEAMER
        • Filling arbitrary shapes with tilted gratings
        • Pattern replacement and filtering for post processing
        • Loops, Variables and Functions
        • Using Loop module in BEAMER
        • BEAMER & Python
        • Python - Graphical User Interfaces
    • Lab
      • SÜSS-MicroOptics Source Mask Optimisation
      • LAB simulation methods and Optical Proximity Correction in Lithography
      • Projection Simulation Example
    • Tracer
      • Handling materials in TRACER for group and individuals
      • Using TRACER to Estimate the Base-Dose for Different Substrates
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
      • Part 2 – Dose PEC Algorithm and Parameter
      • Part 3 – Optimization of Dose PEC Parameter
      • Part 4 – Process Effect, Calibration and Correction
      • Part 5 – Shape PEC – “ODUS” Contrast Enhancement
      • Part 6 - 3D Surface PEC for greyscale lithography
      • Part 7 - 3D T-Gate and Edge PEC for multilayer resist
    • Webinar Series: BEAMER Training
      • Part 2 – Optimization – Field Control
      • Part 3 – Layout Operation
      • Part 4 – Standard Dose PEC - Intro
      • Part 5 – Standard Dose PEC - Parameters
    • Webinar: LAB Simulation of Proximity Lithography
    • Webinar: LAB Simulation of Projection Lithography
    • Webinar: LAB Simulation of Laser Lithography
    • Webinar: LAB Simulation of E-BEAM Lithography
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GenISys GmbH
Skip navigation
  • Products
    • BEAMER
    • LAB
    • TRACER
    • MASKER
    • ProSEM
    • InSPEC
  • Applications
    • Beamer
      • PEC
        • 3D Correction for Dolan Technique
        • Exposure dose for targets and large areas
        • Influence of Shape PEC on Resist Profile
        • 3D E-beam lithography
        • Managing PEC Data Volume to Improve Throughput
        • Dose Assignments for Exposures on Thin Membranes
        • Optimisation of relative dose exposure for critical features
      • Laser PEC
        • Laser Grayscale Lithography
      • Writing Strategy
        • Exposure Strategies for Optimised Writing
        • Multipass Techniques
        • Bulk & sleeving of patterns for time writing optimisation
        • Fracturing of periodic layouts for photonic crystals
      • Data handling
        • Designing Fresnel zone plates using formulas in BEAMER
        • Filling arbitrary shapes with tilted gratings
        • Pattern replacement and filtering for post processing
        • Loops, Variables and Functions
        • Using Loop module in BEAMER
        • BEAMER & Python
        • Python - Graphical User Interfaces
    • Lab
      • SÜSS-MicroOptics Source Mask Optimisation
      • LAB simulation methods and Optical Proximity Correction in Lithography
      • Projection Simulation Example
    • Tracer
      • Handling materials in TRACER for group and individuals
      • Using TRACER to Estimate the Base-Dose for Different Substrates
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
      • Part 2 – Dose PEC Algorithm and Parameter
      • Part 3 – Optimization of Dose PEC Parameter
      • Part 4 – Process Effect, Calibration and Correction
      • Part 5 – Shape PEC – “ODUS” Contrast Enhancement