Nano-Micro-Lithography Symposium 2021

The annual summer Joint Symposium on Direct Write, Optical, Ion and Electron Beam Lithography will once again be held in the form of a virtual event. At this symposium, technical experts and customers from Nanoscribe, micro resist technology, Heidelberg Instruments, Raith and GenISys will present the latest, state-of-the-art developments in direct-write Nano-Micro-Lithography, including technology, materials, and applications. In addition, several users of these products will provide detailed insights into their projects and experiences.

      Date: June 30, 2021, starting at 10 am CEST
      Place: Online on - the event link will be provided closer to the event date

Using as a virtual event platform will allow you to attend all presentations in the conference rooms, to meet individual representatives from each company, and talk to other participants.
Use this opportunity to find inspirations and innovative ideas for your projects, meet GenISys and discuss your micro-fabrication applications and plans with us.

Our expert Uli Hofmann will present you the ULTIMATE Automation of SEM Metrology “If you can not measure it, you can not improve it.” at 12:30. Please do not miss this interesting presentation.


REGISTRATION HERE  (Please scroll down the page for the registration)


Please see the agenda in the attachment below or on the registration page.

If you have any questions please feel free to contact us:

More webinars and events will follow, so please follow us on LinkedIn.

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