Joint Online Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Due to the corona pandemic, the Joint Symposium on Direct Write, Optical, Ion and Electron Beam Lithography will take place online this year. It is organized in collaboration with Raith GmbH, Nanoscribe, micro resist technology and GenISys GmbH and brings together technical experts in their respective fields of state-of-the-art direct-write capabilities.

      Date: December 3rd, 2020, 9:30 – 16:00 CET

GenISys experts are also at hand for a “Process Clinic” between 14:00 – 16:00. A separate on-line meeting room will be available for an interactive workshop on BEAMER software to discuss specific user question and application.

If you are interested in the latest updates on nanolithography, please register directly on Raith's Homepage: https://www.raith.com/events/symposia/

Participation is free and the link for the Online Meeting will be sent to you two days before the event.

We are looking forward to seeing you at the Online Symposium in December!