Maskless Laser Lithography and Direct Writing for Nano- and Microfabrication – Technical Workshop & Discussion

"Maskless Laser Lithography and Direct Writing for Nano- and Microfabrication - Technical Workshop & Discussion” will be held as a joint Event in September at the MNE 2021. At this workshop, technical experts and customers from Heidelberg Instruments, micro resist technology, Multiphoton Optics and GenISys will present the latest, state-of-the-art developments in direct-write Nano-Micro-Lithography.

    Date:  Monday, Sept. 20th, 2021, 14:00 - 17:30 CEST (MNE 2021: 20.09-23.09.2021)
    Place: Lingotto Convention and Exhibition Center, Turin, Italy
    Platform: Microsoft TEAMS (the event link will be provided closer to the event date)

Join us - in-person or online - and get deep insights into latest developments and advances in maskless laser lithography and direct writing, and discuss with the technical experts and users from the academia your product, software and material requirements in nano- and microfabrication for the creation of 2D and complex 2.5 and 3D structures in micro-optics, photonics, microfluidics and nanobiotechnology, electronics and communication technology, and in materials science - no matter how challenging.

The participation is free of charge.

REGISTRATION - On Site and On-Line


2:00 pm    Welcome and Introduction

2:10 pm    Advances in Direct Write Lithography
              Dr Daniel-Alexander Braun, Heidelberg Instruments Mikrotechnik GmbH, Germany

2:30 pm   Moving towards maskless fabrication of quantum sensors
              Dr Patryk Krzysteczko, Physikalisch-Technische Bundesanstalt, Germany

2:50 pm   Insights in photoresist chemistry for grey scale lithography
              Dr Christine Schuster, micro resist technology GmbH, Germany

3:10 pm   Additive manufacturing of microoptics via 3D Laser Lithography
              Willi Mantei, Multiphoton Optics GmbH, Germany

3:20 pm   Coffee break & networking

3:40 pm   Laser Lithography Simulation and Correction Software
              Nezih Unal, Aditya Reddy, GenISys GmbH, Germany

4:00 pm   Bend the curve: The benefit of optical proximity correction in laser direct write lithography    
              Helmut Schift, Jan Erjawetz, Paul-Scherrer Institut (PSI), Switzerland

4:30 pm   NanoFrazor - A Nanofabrication tool for 2D & 3D Devices
              Dr Felix Holzner, Heidelberg Instruments Nano AG, Switzerland

4:50 pm   Advances on thermally assisted magnetic nanolithography and applications
              Edoardo Albisetti, Politecnico di Milano, Italy

5:10 pm   Summary & Open Discussion

5:30 pm   Closing

Please also visit and register for our BEAMeeting MNE 2021 – it will be hold on the same day in the morning. For detailed Information and registration, please click HERE.

Please stay tuned to our website and follow GenISys LINKEDIN.

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