Nano-Micro-Lithography Symposium November 2021
Following the great success of the last two Nano-Micro-Lithography Symposia, the fall edition of our joint event will again take the form of a virtual event. This online event brings together technical experts, customers and users from GenISys GmbH, Nanoscribe, micro resist technology GmbH, Heidelberg Instruments and Raith, discover the latest technologies and products for Nano-Micro-Lithography. Several system users from the participating companies will provide detailed insights into their micro-fabrication projects and describe experiences with various products and technologies. In addition, there will be an inspiring student project pitch and numerous networking opportunities to discuss your projects. Also new is a dedicated job fair with information on current job openings and the opportunity to talk specifically about jobs and careers with representatives from participating companies.
So please save the date in your calender --
Date: November 4th, 2021, starting at 8.30 am CET
Place: Online on gather.town - the event link will be provided closer to the event date
REGISTRATION
To register for Nano-Micro-Lithography Symposium, please click HERE (Please scroll down the page until after the agenda)
Preliminary Agenda
| 8:00 CET | Access to gather.town |
|---|---|
| 8:30 CET | Welcome & organizational hints |
| 8:40 CET | Session 1 |
| 8:40 | e-Beam and Laser Lithography Simulation – pushing the limits of nanofabrication Thomas Michels, GenISys |
| 9:05 | Fabrication of photonic and optomechanical circuits with BEAMER and RAITH VOYAGER EBL Erik Holmgren, AlbaNova Nanolab, KTH |
| 9:30 | Rapid prototyping and production of 3D mechanical microparts Dr. Benjamin Richter, Nanoscribe |
| 9:55 | Two-Photon 3D-printed structure on capillary tip for micromanipulation and fluid manipulation Antoine Barbot, femto-st |
| 10:20 | Matching lithography processes to implement hierarchical nano-micro-pattern Johannes Wolf, micro resist technology |
| 10:45 | Challenges for integration of optical elements Dr. Danny Reuter, Zentrum für Mikrotechnologien, TU Chemnitz |
| 11:10 CET | Networking Visiting booths & exchange of thoughts |
| 12:00 CET | Lunch break |
| 13:00 CET | Students project pitch 15 undergraduate and graduate students present inspiring topics. Each speaking very concisely about project idea, microfabrication task, and key innovation. |
| 14:00 CET | Session 2 |
| 14:00 | Maskless grayscale lithography Dominique Collé, Heidelberg Instruments Mikrotechnik |
| 14:25 | Cleanroom in a Glovebox Professor Kenneth Burch, Boston College |
| 14:50 | The new EBPG Plus: E-Beam Lithography applications with a Plus in Throughput and Precision Frank Nouvertné, Raith GmbH Germany |
| 15:15 | Large area x-ray gratings for space, meta lenses and Quantum devices on 2D materials – a wide range of cutting edge applications for EBL at Penn State Chad Eichfeld, Penn State University |
| 15:25 to 15:30 CET | Concluding remarks and farewell |
| 15:30 to 16:00 CET | Networking & visiting booths |
| 16:00 CET | Event finds to its end |
If you have any questions please feel free to contact us: marketing@genisys-gmbh.com
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