Webinar - LAB 5.4.0

GenISys LAB offers the most comprehensive lithography simulation package for use with projection (stepper), proximity (mask-aligner), laser and e-beam lithography. We are pleased to announce a new release LAB v5.4.0. This inlcudes many new features such as import of metrology data, contour overlay for comparison, and laser simulation for HIMT DWL system. Improvements and upgrades have also been made to general usability and results visualization.

To present our LAB 5.4.0, we would like to invite you to a short webinar about the new features and functionalities in LAB followed by a Q&A session.

Date: Thursday, October 22, 2020 at 9:00am CEST

Platform: Microsoft TEAMS (The link will be sent later after registration)

If you wish to attend this Webinar, please register with an E-Mail to marketing@genisys-gmbh.com, indicating your Name/Organization/Location/Function.

You will receive a link to join the Microsoft Teams Webinar.


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