Source Mask Optimization
SUSS has introduced the technology to control the angular spectrum using illumination filter plates (IFP) in the exposure optics. The optimum IFP design depends on feature dimensions, feature shapes and the proximity gap. The optimum combination of IPF design and mask layout modification improves the quality of proximity lithography. Simulation is essential for this source-mask optimization.
LAB provides full simulation from light source to the 3D resist profile after development. It supports the different SUSS mask aligner models with their exposure optics. The MO exposure optics with the set of standard illumination plate is available. It is possible to simulate a mask layout using the different source shapes and determine which is the best for the specific mask and exposure conditions. It is also possible to optimize the light source in combination with the mask layout. The user has complete access to do a wide range of per-exposure estimation and pattern feasibility analysis, thus saving time and cost.