BEAMeeting Munich 2025
The GenISys BEAMeeting Munich 2025 took place on March 26–27 at the Technical University of Munich (TUM), Garching campus, Germany, for both on-site and on-line attendees. The meeting was well-attended, creating an excellent atmosphere for knowledge exchange and networking.
Our General Manager Uli Hofmann, Vice President Nezih Ünal, along with all product managers, regional managers, and application engineers, were present to provide a comprehensive overview of GenISys' business and to engage with participants on different topics throughout the meeting.
The program featured many inspiring presentations from both GenISys users and the team, inspiring lively discussions and valuable insights. A particular highlight was the keynote talk “EBL at Age 65” delivered by Prof. Dieter Kern from the University of Tübingen.
Another standout moment was the cleanroom tour at TUM, organized by our host Prof. Kai Müller, offering attendees insight into the TUM facility.
We extend our sincere thanks to everyone who helped make this event a success! We hope the ideas shared and connections formed will lead to exciting new collaborations and innovations in lithography and metrology.
A special thank-you to Prof. Kai Müller for hosting us and making this meeting possible — your support is greatly appreciated!
The following are the BEAMeeting presentations and recorded videos.
BEAMeeting Presentations
GenISys_Update
Development of THz Devices with Electron Beam Lithography
Living on the edge Correction in BEAMER
MPL new research projects
EBL at age 65 - a retrospect
Development of sub-100nm T-Gate for industry application
Triple Layer T-Gate Process
Preparing Photonic Devices in BEAMER
Advancements in Fabricating High-Precision VLS Blazed Gratings on Non-Flat Silicon Substrates
ProSEM for Photonic Applications
ProSEM and InSPEC Update
BEAMER Update
BEAMeeting Videos
GenISys_Update
Development of THz Devices with Electron Beam Lithography
Living on the edge Correction in BEAMER
MPL new research projects
EBL at age 65 - a retrospect
Development of sub-100nm T-Gate for industry application
Triple Layer T-Gate Process
Preparing Photonic Devices in BEAMER
Advancements in Fabricating High-Precision VLS Blazed Gratings on Non-Flat Silicon Substrates
ProSEM for Photonic Applications
ProSEM and InSPEC Update
BEAMER Update