BEAMeeting Munich 2026

The GenISys BEAMeeting Munich 2026 took place on April 22–23 at the Holiday Inn Munich and the GenISys Headquarters in Germany, welcoming both on-site and online participants. The event brought together more than 40 members of the GenISys community for two highly interactive and inspiring days, creating an excellent atmosphere for knowledge exchange, networking, and collaboration.

The meeting featured a comprehensive program of technical trainings, workshops, product updates, and open discussions covering BEAMER, LAB, ProSEM, and InSPEC. With strong participation from both academia and industry, the sessions focused on advanced lithography, SEM metrology, and a wide range of nanofabrication applications.

Throughout the BEAMeeting, GenISys product managers, regional managers, and application engineers provided detailed insights into the latest developments and updates.

We were especially pleased to welcome outstanding contributions from our users, whose presentations significantly enriched the program and sparked highly engaging discussions:

• Christian Schmid (TU Munich) - Creating High-Precision Structures for Photonic Integrated Circuits
• Janine Börner (IMS Chips) - VSB Lithography for Integrated Photonics: Shot Analysis and Calibration
• Makhlad Chahid (EPFL) - SEM Metrology for Lithography and Nanofabrication Applications
• Patrick Qualm (AMOLF) - Sliced Nanobeams E-Beam Fabrication Optimization

We sincerely thank all speakers for sharing their expertise and contributing to the success of the meeting.

A special topic of this year's meeting was the announcement of the new GenISys management. Sven Bauerdick, Robert Polster, and Michael Krüger, briefly introduced themselves and their mission within the company. At the same time, we're happy that former general managers and founders Uli Hofmann and Nezih Unal continue in key positions within GenISys.

One of the most valuable aspects of the BEAMeeting was the strong interaction between users and the GenISys team, including application spotlights, publication updates, and open discussions on future developments and solutions. This has been triggered also during the complementary program before and after the core schedule, given by the training as well as short technical introduction sessions.

We would like to thank all participants, speakers, and contributors who helped making the GenISys BEAMeeting Munich 2026 a great success. We hope that the ideas shared and the connections established during the event will lead to new collaborations and advancements in lithography and metrology.

The following are the presentations at the BEAMeeting Munich 2026: