Based in Munich, Germany, with offices in Tokyo, Japan, and San Francisco, California, GenISys develops markets and supports flexible, high-performance software solutions for the optimization of micro- and nano- fabrication processes. Addressing the market for lithography and inspection, GenISys combines deep technical expertise in layout data processing, process modeling, correction and optimization with world class software engineering and a strong focus on ease of use for applications in IC prototyping, mask production, DfM development and MEMS. For electron-beam direct write and mask manufacturing, our data preparation and proximity effect correction software helps to push the limits of electron-Beam technology. Since its foundation in 2005, GenISys has become a global market leader in the field of electron-beam lithography software and is expanding to related markets and applications.
As a company focused on customer service, GenISys delivers fast, highly dedicated support for application and development of needed functionality to meet demanding customer needs. At GenISys you will find challenge, variety, and a chance to apply your individual talents to some of the most complex problems in the world.
GenISys is a young company based in Taufkirchen - Munich serving a nieche in the semiconductor design flow segment - home in a global market and working across borders in order to achieve the best customer value. Our customers push the boundaries to deliver new technologies to the world. They trust us in making their technologies stronger - with high-performance products, top-quality and dedicated support. We trust you to make them better.
At GenISys you will find challenge, variety, and a chance to apply your individual talents to some of the most complex software design problems in the world. Our collaborative environment combined with a commitment to work/life balance makes GenISys an ideal place to advance your career and challenge your mind.