The BEAMeeting will be held on 30th of Mayfrom 9:00am untill 3:00pm.
You are very welcome to visit our booth at the EIPBN 2017 conference at Orlando from - 30th May 2017 until 2nd June 2017.
SEMICON Moscow 2017
Please meet us June 07 and 08 2017 at SEMICON Moscow 2017 Exhibition at booth A18 with KBTEM-OMO. We will present and demo the latest…
EMLC 2017 Dresden
GenISys will attend and have a booth at EMLC 2017 in Dreden during June 27&28 2017. We will present and demo the latest status of BEAMER,…
MNE 2017 - Braga / Portugal - BEAMeeting
Our traditional BEAMeeting during the MNE 2017 is planned for Monday, 18th of September, 2017 from 09:00 till…
KBTEM-OMO JSC and GenISys Announce Cooperation
Minsk, Belarus, February 06, 2015 - KBTEM-OMO JSC, Republic of Belarus, a leading tool supplier and process…
Heidelberg Instruments and GenISys Announce Cooperation on Maskless Laser Lithography
Heidelberg, GERMANY, October 21, 2014 – Heidelberg Instruments,…
Publication: 3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATION" - IN SUSS REPORT 2013/01
3D TOPOGRAPHY MASK ALIGNER LITHOGRAPHY SIMULATON, Authors: Ulrich…