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Electron Scattering and Process Effects Quantified

A Point Spread Function (PSF) is the essential input for any type of Proximity/Process Effect Correction (PEC) or e-beam simulation. A PSF describes the deposited energy as a function of the distance from the incident beam. In other words, a PSF can be described as the convolution of the electron scattering beam size (or beam blur) and process effects, which can include collateral effects from resist  evelopment and pattern transfer. The quality of a process effect correction depends en tirely on the knowledge of the PSF and process correction parameters such as base dose and process bias. As such, a necessary starting point is a highquality Monte Carlo (MC) simulation of not only electrons backscattered from the substrate, but also fast secondary electrons from both the primary exposure and  ackscattering events.
 

TRACER Major Features

  • Monte Carlo simulator that computes the electron-solid interaction for optimal electron-beam exposures, including beam blur
  • Process calibration using experimental data
  • Archive to maintain and manage all PSFs
  • Visualization tool for PSF inspection
  • Faciliator to combine electron-PSF and process-PSF into a singleeffective- PSF, or to seperate out the process-contribution-PSF from an experimental-PSF
  • Dose factor calculator between two PSF’s
  • Electron trajectory visualization (results can be exported for postprocessing)
 
Comprehensive Information (PDF)

TRACER user interface with simulated PSF

Visualization of simulated trajectories

Extensive library of materials and resists

TRACER process calibration feature