Electron Scattering and Process Blur quantified

genisysA Point Spread Function (PSF) is the essential input for any type of Proximity / Process Effect Correction or e-beam simulation and defines the deposited energy as a function of the distance from the incident beam. One can think of it as the convolution of electron scattering, beam size (or beam blur), and process effects. The quality of a process effect correction entirely depends on the knowledge of that PSF.

As such, a good starting point is the Monte Carlo (MC) simulation that includes the fast secondaries generated by the primary exposure as well as the backscattering process.

TRACER offers an easy to use interface for defining the parameters (material data, stack parameters, acceleration voltage), running the MC simulation, visualization of r-z simulation results (energy spread at different resist thicknesses), and the extraction of the 1D PSF which can be used for PEC.

In addition, the tool contributions such as spot size and process blurs such as diffusion need to be quantified and factored in.

BEAMER comes with the essential tools to experimentally quantify tool and process contributions.

TRACER includes all the essentials needed to combine Monte-Carlo PSFs and process PSFs into one effective PSF that describe a particular process, to archive and maintain these functions.



  • Monte Carlo simulator that allows to compute the electron-solid interaction part of the exposure
  • Archive/maintain/manage all point spread functions
  • Visualization tool that allows to make a judgment on the quality of the PSF
  • Facilitator to combine electron PSFs and process PSFs into an effective PSF or to separate out the process contribution PSF from an experimental PSF
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