logo-icon-genisys

Publications

Duplikat von Mask aligner lithography simulation for layout verification and optimization using OPC methodology

H. Lerch, B. Meliorisz, D. Ritter
6th IISB Lithography Simulation Workshop, September 2008, Athens

For download, please push button below

/web/assets/downloadInfos/P_Mask aligner lithography simulation for layout verification and optimization using OPC methodology, 6th IISB Lithography Simulation Worshop_2008_10_A.pdf