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Duplikat von Optimization of illumination pupils and mask structures for proximity printing

K. Motzek, A. Bich, A. Erdmann, M. Hornung, M. Hennemeyer, B. Meliorisz, U. Hofmann, N. √únal, R. Voelkel, S. Partel, P. Hudek
Microelectronic Engineering, Volume 87, Issues 5-8, May-August 2010, Pages 1164-1167

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