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Publications

Duplikat von Simulation for Advanced Mask Aligner Lithography

Ulrich Hofmann, Daniel Ritter, Balint Meliorisz, Nezih Ünal, GenISys GmbH
Michael Hornung, Ralph Zoberbier, SUSS MicroTec Lithography
Published in "SUSS Report 01/2012"

 Push button below for download of SUSS Report 01/2012 - see page 8 till 11
http://www.suss.com/fileadmin/user_upload/suss_report/SUSS_Report_01_2012_Original_2248.pdf