Base Dose Factor
When first applying an established resist process to a different substrate material stack, it is necessary to determine a new base dose. Running a full dose matrix consumes time and resources. However, TRACER can be used to predict the relative change in base dose needed for different substrates for the same resist process; this can save significant experiment time.
After simulation the PSFs of both substrate stacks TRACER can calculate the base dose factor between the exposure of the two different substrates.