GenISys develops, markets and supports software solutions for the optimization of lithography and inspection for nano fabrication processes
GenISys develops, markets and supports software solutions for the optimization of lithography and inspection for nano fabrication processes
Software for superior e-Beam Lithography:
Data Preparation,Fracturing, PEC and Process Correction
Lithography 3D Simulation Software:
Mask and process optimization platform for projection stepper, proximity aligner, laser and e-beam
Extending the limits of Laser Lithography:
Correction for gray-scale laser lithography for HIMT
Monte Carlo simulation to compute point-spread-function (PSF) and perform process calibration for electron beam proximity effect correction (PEC).

GenISys - Advancing the Standard

Software products for pattern data preparation, proximity and process correction, lithography simulation, inspection and metrology that give researchers, manufacturers and system suppliers unparalleled efficiency, ease of use and optimal value for advanced nano-patterning technologies.

BEAMER, introduced in 2006, has become the de-facto standard for e-beam direct write pattern processing. Most major nano-fabrication centers worldwide use BEAMER and TRACER to push the limits of their processes and demanding applications. By combining powerful layout operation, comprehensive proximity & process correction, superior curved fracturing and field positioning control, BEAMER enables a wide-range of demanding applications.

Our 3D lithography simulation software LAB, first introduced for proximity lithography, has become a key enabler for the flat panel display industry. LAB has been extended to cover projection (stepper), laser, and e-beam lithography, and is currently the most comprehensive OPC and simulation platform.

ProSEM, introduced in 2017, makes fast, consistent and easy measurement of SEM images. It supports all major SEM image formats and combines ease of use, with flexibility and powerful automation capabilities.