Superior data preparation for electron- and laser-beam lithography exposure
BEAMER is the most comprehensive lithography software for optimized electron- and laser-beam exposure.
Layout and process optimization platform for most common lithography technologies
LAB enable next generation products and faster development by computational design and process optimization.
Electron Scattering and Process Effects Quantified
TRACER is a Monte Carlo simulator that computes the electron-solid interaction of any arbitrary material stack and performs advanced process calibration for electron beam proximity effect correction.
Mask Data Preparation (MDP) and Mask Process Correction (MPC) addressing the needs of non-standard masks
Optimal mask productivity and quality for flat panel display (FPD), photonics, IoT and special devices.
Advanced SEM Image Analysis, Metrology & Automation Software Package
ProSEM easily provides consistent feature measurements for your process calibration and monitoring tasks. With optional digital interfaces it can connect to your SEM for automated image acquisition.
Integrated SEM Metrology & Inspection Software Suite and Upgrade Kit
InSPEC provides advanced multi-chip metrology jobs with integrated scanning, contour detection, corrections, and data processing.
