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    • Advanced exposure technique
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    • LAB supports SUSS optics
    • LAB enables OPC
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    • Webinar Series: Proximity Effect in E-Beam Lithography
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GenISys GmbH
Skip navigation
  • Products
    • BEAMER
    • TRACER
    • LAB
    • ProSEM
    • MASKER
  • Applications
    • Advanced exposure technique
    • Fracture Optimization
    • Flexibility
    • LAB supports SUSS optics
    • LAB enables OPC
    • Multipass Exposure
    • 3D PEC
    • Base Dose Factor
    • Laser Grayscale Lithography
    • PEC for Exposure on Thin Membranes
    • Mixed Exposure Strategies
    • Shape PEC
    • Projection Simulation Quick Guide
    • PEC: Data Volume and Throughput
    • Pattern Replacement for Post Processing
  • In-Action
    • Webinar Series: Proximity Effect in E-Beam Lithography
    • Webinar - E-Beam Lithography Simulation
    • Webinar Series: BEAMER Training
  • Corporate
    • News
    • GenISys Profile
    • GenISys History
    • Career Opportunities
  • Login
  • Contact

Products

Superior data preparation for electron- and laser-beam lithography exposure

BEAMER is the most comprehensive lithography software for optimized electron- and laser-beam exposure.

Electron Scattering and Process Effects Quantified

TRACER is a Monte Carlo simulator that computes the electron-solid interaction of any arbitrary material stack and performs advanced process calibration for electron beam proximity effect correction.

Layout and process optimization platform for most common lithography technologies

LAB enable next generation products and faster development by computational design and process optimization.

Automated Feature Measurements from SEM Images

ProSEM analyzes your SEM image files, giving you fast, consistent feature measurements for your process calibration and monitoring tasks.

Mask Data Preparation (MDP) and Mask Process Correction (MPC) addressing the needs of non-standard masks

Optimal mask productivity and quality for flat panel display (FPD), photonics, IoT and special devices.

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