Exposure Strategies for Optimised Writing

Motivation:

The craving for faster and higher storage technologies has raised challenges in the design and fabrication of devices. With this, quality and performance could be compromised. Accordingly, the need for tools that push equipment limits while preserving high outcomes is of utmost importance.

Solution:

BEAMER provides the tools to manage the field sorting within a layout, thus, influencing tool throughput. The exclusive Export and Fields modules give control over field ordering and writing direction. These modules decrease patterning issues and increase device quality.